Using machine learning technology to accelerate the development of plasma etching processes

Author(s) : A. Derville; G. Gey; J. Baderot; S. Martinez; G. Bernard; J. Foucher

Date : March 2019

Automated lamellar block copolymer process characterization

Author(s) : G. Bernard; X. Chevalier; A. Dervilllé; J. Foucher

Date : March 2018

Designed tools for analysis of lithography patterns and nanostructures

Author(s) : Alexandre Dervillé; Julien Baderot; Guilhem Bernard; Johann Foucher; Hanna Grönqvist; Aurélien Labrosse; Sergio Martinez; Yann Zimmermann

Date : May 2017

Accelerate the analysis and optimization of lamellar BCP process using machine learning

Author(s) : A. Derville; S. Martinez; G. Gey; J. Baderot; G. Bernard; X. Chevalier; J. Foucher

Date : March 2019

Cognitive learning: a machine learning approach for automatic process characterization from design

Author(s) : J. Foucher; J. Baderot; S. Martinez; A. Dervilllé; G. Bernard

Date : April 2018

Next generation of decision making software for nanopatterns characterization: application to semiconductor industry

Author(s) : A. Dervilllé; A. Labrosse; Y. Zimmermann; J. Foucher; R. Gronheid; C. Boeckx; A. Singh; P. Leray; S. Halder

Date : June 2016

The coming of age of the first hybrid metrology software platform dedicated to nanotechnologies (Conference Presentation)

Author(s) : Johann Foucher; Aurelien Labrosse; Alexandre Dervillé; Yann Zimmermann; Guilhem Bernard; Sergio Martinez; Hanna Grönqvist; Julien Baderot; Florian Pinzan

Date : April 2017

Development of a comprehensive metrology platform dedicated to dimensional measurements of CD atomic force microscopy tips

Author(s) : Johann Foucher; Sebastian W. Schmidt; Aurelien Labrosse; Alexandre Dervillé; Sandra Bos; Sebastian Schade; Bernd Irmer

Date : April 2015